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Atomic Diffusion in Semiconductors (Paperback, Softcover reprint of the original 1st ed. 1973)
Loot Price: R2,438
Discovery Miles 24 380
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Atomic Diffusion in Semiconductors (Paperback, Softcover reprint of the original 1st ed. 1973)
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The diffusion or migration of atoms in matter, of whatever form, is
a basic consequence of the existence of atoms. In metals, atomic
diffusion has a well established position of importance as it is
recognized that there are few metallurgical processes which do not
embody the diffusion of one or more of the constituents. As regards
semiconductors any thermal annealing treatment involves atomic
diffusion. In semiconductor technology diffusion processes provide
a vital and basic means of fabricating doped structures.
Notwithstanding the importance of diffusion in the preparative
processes of semiconductor structures and samples, the diffusion
based aspects have acquired an empirical outlook verging almost on
alchemy. The first attempt to present a systematic account of
semiconductor diffusion processes was made by Boltaks [11 in 1961.
During the decade since Boltaks' book appeared much work germane to
understanding the atomic mechanisms responsible for diffusion in
semiconductors has been published. The object of the present book
is to give an account of, and to consolidate, present knowledge of
semiconductor diffusion in terms of basic concepts of atomic
migration in crystalline lattices. To this end, exhaustive
compilations of empirical data have been avoided as these are
available elsewhere [2, 31 : attention has been limited to
considering evidence capable of yielding insight into the physical
processes concerned in atomic diffusion.
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