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Near Infrared Detectors Based on Silicon Supersaturated with Transition Metals (Hardcover, 1st ed. 2021)
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Near Infrared Detectors Based on Silicon Supersaturated with Transition Metals (Hardcover, 1st ed. 2021)
Series: Springer Theses
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This thesis makes a significant contribution to the development of
cheaper Si-based Infrared detectors, operating at room temperature.
In particular, the work is focused in the integration of the Ti
supersaturated Si material into a CMOS Image Sensor route, the
technology of choice for imaging nowadays due to its low-cost and
high resolution. First, the material is fabricated using ion
implantation of Ti atoms at high concentrations. Afterwards, the
crystallinity is recovered by means of a pulsed laser process. The
material is used to fabricate planar photodiodes, which are later
characterized using current-voltage and quantum efficiency
measurements. The prototypes showed improved sub-bandgap
responsivity up to 0.45 eV at room temperature. The work is further
supported by a collaboration with STMicroelectronics, where the
supersaturated material was integrated into CMOS-based sensors at
industry level. The results show that Ti supersaturated Si is
compatible in terms of contamination, process integration and
uniformity. The devices showed similar performance to non-implanted
devices in the visible region. This fact leaves the door open for
further integration of supersaturated materials into CMOS Image
Sensors.
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