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High Mobility and Quantum Well Transistors - Design and TCAD Simulation (Hardcover, 2013 ed.)
Loot Price: R3,687
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High Mobility and Quantum Well Transistors - Design and TCAD Simulation (Hardcover, 2013 ed.)
Series: Springer Series in Advanced Microelectronics, 42
Expected to ship within 10 - 15 working days
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For many decades, the semiconductor industry has miniaturized
transistors, delivering increased computing power to consumers at
decreased cost. However, mere transistor downsizing does no longer
provide the same improvements. One interesting option to further
improve transistor characteristics is to use high mobility
materials such as germanium and III-V materials. However,
transistors have to be redesigned in order to fully benefit from
these alternative materials. High Mobility and Quantum Well
Transistors: Design and TCAD Simulation investigates planar bulk
Germanium pFET technology in chapters 2-4, focusing on both the
fabrication of such a technology and on the process and electrical
TCAD simulation. Furthermore, this book shows that Quantum Well
based transistors can leverage the benefits of these alternative
materials, since they confine the charge carriers to the
high-mobility material using a heterostructure. The design and
fabrication of one particular transistor structure - the SiGe
Implant-Free Quantum Well pFET - is discussed. Electrical testing
shows remarkable short-channel performance and prototypes are found
to be competitive with a state-of-the-art planar strained-silicon
technology. High mobility channels, providing high drive current,
and heterostructure confinement, providing good short-channel
control, make a promising combination for future technology nodes.
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