The contrasting examples of microwave plasmas given in this volume
demonstrate their capability of not only covering the totality of
expressed needs in that particular field, but in many others. For
example the ions and reactive neutral species, indispensable for
the synergetic effects in etching and deposition processes can be
used in metallurgical treatment, and for materials processing in
general. They also have the ability to dissociate molecules and
excite atoms as required in analytical chemistry where the
information on the constituent concentrations is obtained through
optical spectroscopy or mass spectrometry. Finally, microwave
plasmas can supply the photons for laser and lighting applications.
It is noteworthy that microwave plasmas cover an impressive
pressure range of eight orders of magnitude from 10-3 Pa (10-5
torr) to above atmospheric pressure. The versatility of microwave
plasmas, their moderate cost, and their ease of implementation
particularly appeal to the industrial entrepreneur.
As well as providing a review of current developments, the work
proposes a synthesis on microwave discharges, laying out the
corresponding physical references without developing too much
plasma theory. It will be of interest both to the user, who may not
be overly concerned about plasma science, and to the plasma expert,
who may wish to redirect his interest towards plasma applications,
such as materials processing.
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