Ion Beam Analysis: Fundamentals and Applications explains the basic
characteristics of ion beams as applied to the analysis of
materials, as well as ion beam analysis (IBA) of art/archaeological
objects. It focuses on the fundamentals and applications of ion
beam methods of materials characterization. The book explains how
ions interact with solids and describes what information can be
gained. It starts by covering the fundamentals of ion beam
analysis, including kinematics, ion stopping, Rutherford
backscattering, channeling, elastic recoil detection, particle
induced x-ray emission, and nuclear reaction analysis. The second
part turns to applications, looking at the broad range of potential
uses in thin film reactions, ion implantation, nuclear energy,
biology, and art/archaeology. Examines classical collision theory
Details the fundamentals of five specific ion beam analysis
techniques Illustrates specific applications, including biomedicine
and thin film analysis Provides examples of ion beam analysis in
traditional and emerging research fields Supplying readers with the
means to understand the benefits and limitations of IBA, the book
offers practical information that users can immediately apply to
their own work. It covers the broad range of current and emerging
applications in materials science, physics, art, archaeology, and
biology. It also includes a chapter on computer applications of
IBA.
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