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Chemical Solution Deposition of Functional Oxide Thin Films (Paperback, Softcover reprint of the original 1st ed. 2013)
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Chemical Solution Deposition of Functional Oxide Thin Films (Paperback, Softcover reprint of the original 1st ed. 2013)
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This is the first text to cover all aspects of solution processed
functional oxide thin-films. Chemical Solution Deposition (CSD)
comprises all solution based thin- film deposition techniques,
which involve chemical reactions of precursors during the formation
of the oxide films, i. e. sol-gel type routes, metallo-organic
decomposition routes, hybrid routes, etc. While the development of
sol-gel type processes for optical coatings on glass by silicon
dioxide and titanium dioxide dates from the mid-20th century, the
first CSD derived electronic oxide thin films, such as lead
zirconate titanate, were prepared in the 1980's. Since then CSD has
emerged as a highly flexible and cost-effective technique for the
fabrication of a very wide variety of functional oxide thin films.
Application areas include, for example, integrated dielectric
capacitors, ferroelectric random access memories, pyroelectric
infrared detectors, piezoelectric micro-electromechanical systems,
antireflective coatings, optical filters, conducting-, transparent
conducting-, and superconducting layers, luminescent coatings, gas
sensors, thin film solid-oxide fuel cells, and
photoelectrocatalytic solar cells. In the appendix detailed
"cooking recipes" for selected material systems are offered.
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