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Dry Etching for VLSI (Paperback, Softcover reprint of the original 1st ed. 1991)
Loot Price: R4,448
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Dry Etching for VLSI (Paperback, Softcover reprint of the original 1st ed. 1991)
Series: Updates in Applied Physics and Electrical Technology
Expected to ship within 10 - 15 working days
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This book has been written as part of a series of scientific books
being published by Plenum Press. The scope of the series is to
review a chosen topic in each volume. To supplement this
information, the abstracts to the most important references cited
in the text are reprinted, thus allowing the reader to find
in-depth material without having to refer to many additional
publications. This volume is dedicated to the field of dry (plasma)
etching, as applied in silicon semiconductor processing. Although a
number of books have appeared dealing with this area of physics and
chemistry, these all deal with parts of the field. This book is
unique in that it gives a compact, yet complete, in-depth overview
of fundamentals, systems, processes, tools, and applications of
etching with gas plasmas for VLSI. Examples are given throughout
the fundamental sections, in order to give the reader a better
insight in the meaning and magnitude of the many parameters
relevant to dry etching. Electrical engineering concepts are
emphasized to explain the pros and cons of reactor concepts and
excitation frequency ranges. In the description of practical
applications, extensive use is made of cross-referencing between
processes and materials, as well as theory and practice. It is thus
intended to provide a total model for understanding dry etching.
The book has been written such that no previous knowledge of the
subject is required. It is intended as a review of all aspects of
dry etching for silicon semiconductor processing.
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