0
Your cart

Your cart is empty

Books > Professional & Technical > Energy technology & engineering > Electrical engineering

Buy Now

Dry Etching for VLSI (Paperback, Softcover reprint of the original 1st ed. 1991) Loot Price: R4,448
Discovery Miles 44 480
Dry Etching for VLSI (Paperback, Softcover reprint of the original 1st ed. 1991): A.J.Van Roosmalen, J.A.G. Baggerman, S.J.H....

Dry Etching for VLSI (Paperback, Softcover reprint of the original 1st ed. 1991)

A.J.Van Roosmalen, J.A.G. Baggerman, S.J.H. Brader

Series: Updates in Applied Physics and Electrical Technology

 (sign in to rate)
Loot Price R4,448 Discovery Miles 44 480 | Repayment Terms: R417 pm x 12*

Bookmark and Share

Expected to ship within 10 - 15 working days

This book has been written as part of a series of scientific books being published by Plenum Press. The scope of the series is to review a chosen topic in each volume. To supplement this information, the abstracts to the most important references cited in the text are reprinted, thus allowing the reader to find in-depth material without having to refer to many additional publications. This volume is dedicated to the field of dry (plasma) etching, as applied in silicon semiconductor processing. Although a number of books have appeared dealing with this area of physics and chemistry, these all deal with parts of the field. This book is unique in that it gives a compact, yet complete, in-depth overview of fundamentals, systems, processes, tools, and applications of etching with gas plasmas for VLSI. Examples are given throughout the fundamental sections, in order to give the reader a better insight in the meaning and magnitude of the many parameters relevant to dry etching. Electrical engineering concepts are emphasized to explain the pros and cons of reactor concepts and excitation frequency ranges. In the description of practical applications, extensive use is made of cross-referencing between processes and materials, as well as theory and practice. It is thus intended to provide a total model for understanding dry etching. The book has been written such that no previous knowledge of the subject is required. It is intended as a review of all aspects of dry etching for silicon semiconductor processing.

General

Imprint: Springer-Verlag New York
Country of origin: United States
Series: Updates in Applied Physics and Electrical Technology
Release date: May 2013
First published: 1991
Authors: A.J.Van Roosmalen • J.A.G. Baggerman • S.J.H. Brader
Dimensions: 254 x 178 x 13mm (L x W x T)
Format: Paperback
Pages: 237
Edition: Softcover reprint of the original 1st ed. 1991
ISBN-13: 978-1-4899-2568-8
Categories: Books > Science & Mathematics > Physics > Atomic & molecular physics
Books > Science & Mathematics > Physics > Classical mechanics > General
Books > Professional & Technical > Energy technology & engineering > Electrical engineering > General
Books > Professional & Technical > Electronics & communications engineering > Electronics engineering > Electronic devices & materials > General
Promotions
LSN: 1-4899-2568-6
Barcode: 9781489925688

Is the information for this product incomplete, wrong or inappropriate? Let us know about it.

Does this product have an incorrect or missing image? Send us a new image.

Is this product missing categories? Add more categories.

Review This Product

No reviews yet - be the first to create one!

Partners