This volume is devoted to the physics, instrumentation and
analytical methods of secondary ion mass spectroscopy (SIMS) in
relation to solid surfaces. It describes modern models of secondary
ion formation and the factors influencing sensitivity of
measurements and the range of applications. All the main parts of
SIMS instruments are discussed in detail. Emphasising practical
applications the book also considers the methods and analytical
procedures for constitutional analysis of solids --- including
metals, semiconductors, organic and biological samples. Methods of
depth profiling, spatially multidimensional analysis and study of
processes at the surface, such as adsorption, catalysis and
oxidation, are given along with the application of SIMS in
combination with other methods of surface analysis.
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