Here is the first book to discuss the current understanding of
silver metallization and its potential as a future interconnect
material for integrated circuit technology. With the lowest
resistivity of all metals, silver is an attractive interconnect
material for higher current densities and faster switching speeds
in integrated circuits. Over the past ten years, extensive research
has been conducted to address the issues that have prevented silver
from being used as an interconnect metal. The authors provide
details on a wide range of experimental, characterization, and
analysis techniques. The book is written for students, scientists,
engineers, and technologists in the fields of integrated circuits
and microelectronics research and development.
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