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Plasma Etching - Fundamentals and Applications (Hardcover) Loot Price: R6,309
Discovery Miles 63 090
Repayment Terms: R591 pm x 12*
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Plasma Etching - Fundamentals and Applications (Hardcover): M. Sugawara

Plasma Etching - Fundamentals and Applications (Hardcover)

M. Sugawara

Series: Series on Semiconductor Science and Technology, 7

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Loot Price R6,309 Discovery Miles 63 090 | Repayment Terms: R591 pm x 12*

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The focus of this book is the remarkable advances in understanding of low pressure RF (radio frequency) glow discharges. A basic analytical theory and plasma physics are explained. Plasma diagnostics are also covered before the practicalities of etcher use are explored.

General

Imprint: Oxford UniversityPress
Country of origin: United Kingdom
Series: Series on Semiconductor Science and Technology, 7
Release date: 2001
First published: May 1998
Authors: M. Sugawara (Professor)
Dimensions: 242 x 163 x 23mm (L x W x T)
Format: Hardcover
Pages: 356
ISBN-13: 978-0-19-856287-0
Categories: Books > Science & Mathematics > Physics > States of matter > Plasma physics
Books > Science & Mathematics > Physics > Applied physics & special topics > General
Books > Professional & Technical > Energy technology & engineering > Electrical engineering > General
Books > Professional & Technical > Electronics & communications engineering > Electronics engineering > General
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LSN: 0-19-856287-X
Barcode: 9780198562870

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