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Advances in X-Ray Analysis (Paperback, Softcover reprint of the original 1st ed. 1991)
Loot Price: R1,714
Discovery Miles 17 140
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Advances in X-Ray Analysis (Paperback, Softcover reprint of the original 1st ed. 1991)
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The 39th Annual Denver X-Ray Conference on Applications of X-Ray
Analysis was held July 30 -August 3, 1990, at the Sheraton
Steamboat Resort and Conference Center, Steamboat Springs,
Colorado. The "Denver Conference" is recognized to be a major event
in the x-ray analysis field, bringing together scientists and
engineers from around the world to discuss the state of the art in
x-ray applications as well as indications for future develop ments.
In recent years there has been a steady expansion of applications
of x-ray analysis to characterize surfaces and thin films. To
introduce the audience to one of the exciting and important new
developments in x-ray fluorescence, the topic for the Plenary
Session of the 1990 Conference was: "Surface and Near-Surface X-Ray
Spectroscopy. " The Conference had the privilege of inviting five
leading world experts in the field of x-ray spectroscopy to deliver
lectures at the Plenary Session. The first two lectures were on
total-reflection x-ray fluorescence spectrometry. Professor P.
Wobrauschek of Austria reviewed "Recent Developments and Results in
Total-Reflection X-Ray Fluorescence. " Trends and applications of
the technique were also discussed. Dr. T. Arai of Japan reported on
"Surface and Near-Surface Analysis of Silicon Wafers by Total
Reflection X-Ray Fluorescence. " He emphasized the importance of
using proper x-ray optics to achieve high signal-to-noise ratios. A
mathematical model relating the x-ray intensity to the depth of
x-ray penetration was also described.
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