Advances in Rapid Thermal and Integrated Processing (Paperback, Softcover reprint of hardcover 1st ed. 1996)

Rapid thermal and integrated processing is an emerging single-wafer technology in ULSI semiconductor manufacturing, electrical engineering, applied physics and materials science. Here, the physics and engineering of this technology are discussed at the graduate level. Three interrelated areas are covered. First, the thermophysics of photon-induced annealing of semiconductor and related materials, including fundamental pyrometry and emissivity issues, the modelling of reactor designs and processes, and their relation to temperature uniformity. Second, process integration, treating the advances in basic equipment design, scale-up, integrated cluster-tool equipment, including wafer cleaning and integrated processing. Third, the deposition and processing of thin epitaxial, dielectric and metal films, covering selective deposition and epitaxy, integrated processing of layer stacks, and new areas of potential application, such as the processing of III-V semiconductor structures and thin- film head processing for high-density magnetic data storage.

General

Imprint:	Springer
Country of origin:	Netherlands
Series:	NATO Science Series E:, 318
Release date:	December 2010
First published:	1996
Editors:	F. Roozeboom
Dimensions:	240 x 160 x 29mm (L x W x T)
Format:	Paperback
Pages:	566
Edition:	Softcover reprint of hardcover 1st ed. 1996
ISBN-13:	978-90-481-4696-3
Categories:	Books > Professional & Technical > Mechanical engineering & materials > Materials science > Testing of materials > General Books > Professional & Technical > Electronics & communications engineering > Electronics engineering > Electronic devices & materials > General Books > Science & Mathematics > Chemistry > Analytical chemistry > Qualitative analytical chemistry > Chemical spectroscopy, spectrochemistry > General
LSN:	90-481-4696-8
Barcode:	9789048146963

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