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Precision Landmark Location for Machine Vision and Photogrammetry - Finding and Achieving the Maximum Possible Accuracy (Hardcover, 2008 ed.)
Loot Price: R3,017
Discovery Miles 30 170
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Precision Landmark Location for Machine Vision and Photogrammetry - Finding and Achieving the Maximum Possible Accuracy (Hardcover, 2008 ed.)
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The applications of image-based measurement are many and various:
image-guided surgery, mobile-robot navigation, component alignment,
part inspection and photogrammetry, among others. In all these
applications, landmarks are detected and located in images, and
measurements made from those locations.Precision Landmark Location
for Machine Vision and Photogrammetry addresses the ubiquitous
problem of measurement error associated with determining the
location of landmarks in images. With a detailed model of the image
formation process and landmark location estimation, the Cramer-Rao
Lower Bound (CRLB) theory of statistics is applied to determine the
least possible measurement uncertainty in a given situation.This
monograph provides the reader with: the most complete treatment to
date of precision landmark location and the engineering aspects of
image capture and processing; detailed theoretical treatment of the
CRLB; a software tool for analyzing the potential
performance-specific camera/lens/algorithm configurations; two
novel algorithms which achieve precision very close to the CRLB; an
experimental method for determining the accuracy of landmark
location; and, downloadable MATLAB registered] package to assist
the reader with applying theoretically-derived results to practical
engineering configurations. All of this adds up to a treatment that
is at once theoretically sound and eminently practical.Precision
Landmark Location for Machine Vision and Photogrammetry will be of
great interest to computer scientists and engineers working with
and/or studying image processing and measurement. It includes
cutting-edge theoretical developments and practical tools so it
will appeal to research investigators and system designers.
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