This book provides a comprehensive survey of the technology of
flash lamp annealing (FLA) for thermal processing of
semiconductors. It gives a detailed introduction to the FLA
technology and its physical background. Advantages, drawbacks and
process issues are addressed in detail and allow the reader to
properly plan and perform their own thermal processing. Moreover,
this books gives a broad overview of the applications of flash lamp
annealing, including a comprehensive literature survey. Several
case studies of simulated temperature profiles in real material
systems give the reader the necessary insight into the underlying
physics and simulations. This book is a valuable reference work for
both novice and advanced users.
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