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Books > Science & Mathematics > Chemistry > Analytical chemistry > Qualitative analytical chemistry > Chemical spectroscopy, spectrochemistry

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Auger- and X-Ray Photoelectron Spectroscopy in Materials Science - A User-Oriented Guide (Hardcover, 2013 ed.) Loot Price: R9,574
Discovery Miles 95 740
Auger- and X-Ray Photoelectron Spectroscopy in Materials Science - A User-Oriented Guide (Hardcover, 2013 ed.): Siegfried...

Auger- and X-Ray Photoelectron Spectroscopy in Materials Science - A User-Oriented Guide (Hardcover, 2013 ed.)

Siegfried Hofmann

Series: Springer Series in Surface Sciences, 49

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Loot Price R9,574 Discovery Miles 95 740 | Repayment Terms: R897 pm x 12*

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To anyone who is interested in surface chemical analysis of materials on the nanometer scale, this book is prepared to give appropriate information. Based on typical application examples in materials science, a concise approach to all aspects of quantitative analysis of surfaces and thin films with AES and XPS is provided. Starting from basic principles which are step by step developed into practically useful equations, extensive guidance is given to graduate students as well as to experienced researchers. Key chapters are those on quantitative surface analysis and on quantitative depth profiling, including recent developments in topics such as surface excitation parameter and backscattering correction factor. Basic relations are derived for emission and excitation angle dependencies in the analysis of bulk material and of fractional nano-layer structures, and for both smooth and rough surfaces. It is shown how to optimize the analytical strategy, signal-to-noise ratio, certainty and detection limit. Worked examples for quantification of alloys and of layer structures in practical cases (e.g. contamination, evaporation, segregation and oxidation) are used to critically review different approaches to quantification with respect to average matrix correction factors and matrix relative sensitivity factors. State-of-the-art issues in quantitative, destructive and non-destructive depth profiling are discussed with emphasis on sputter depth profiling and on angle resolved XPS and AES. Taking into account preferential sputtering and electron backscattering corrections, an introduction to the mixing-roughness-information depth (MRI) model and its extensions is presented.

General

Imprint: Springer-Verlag
Country of origin: Germany
Series: Springer Series in Surface Sciences, 49
Release date: October 2012
First published: 2013
Authors: Siegfried Hofmann
Dimensions: 235 x 155 x 34mm (L x W x T)
Format: Hardcover
Pages: 528
Edition: 2013 ed.
ISBN-13: 978-3-642-27380-3
Categories: Books > Professional & Technical > Mechanical engineering & materials > Materials science > General
Books > Science & Mathematics > Chemistry > Analytical chemistry > Qualitative analytical chemistry > Chromatography
Books > Science & Mathematics > Chemistry > Analytical chemistry > Qualitative analytical chemistry > Chemical spectroscopy, spectrochemistry > General
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LSN: 3-642-27380-7
Barcode: 9783642273803

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