An important resource for students, engineers and researchers working in the area of thin film deposition using "physical vapor deposition" (e.g. "sputtering") for semiconductor, liquid crystal displays, high density recording media and photovoltaic device (e.g. thin film solar cell) manufacturing. This book also reviews microelectronics industry topics such as history of inventions and technology trends, recent developments in sputtering technologies, manufacturing steps that require sputtering of thin films, the properties of thin films and the role of sputtering target performance on overall productivity of various processes. Two unique chapters of this book deal with productivity and troubleshooting issues.

The content of the book has been divided into two sections: (a) the "first section" (Chapter 1 to Chapter 3) has been prepared for the readers from a range of disciplines (e.g. electrical, chemical, chemistry, physics) trying to get an insight into use of sputtered films in various devices (e.g. semiconductor, display, photovoltaic, data storage), basic of sputtering and performance of sputtering target in relation to productivity, and (b) the "second section" (Chapter 4 to Chapter 8) has been prepared for readers who already have background knowledge of sputter deposition of thin films, materials science principles and interested in the details of sputtering target manufacturing methods, sputtering behavior and thin film properties specific to semiconductor, liquid crystal display, photovoltaic and magnetic data storage applications.

In Chapters 5 to 8, a general structure has been used, i.e. a description of the applications of sputtered thin films, sputtering target manufacturing methods (including flow charts), sputtering behavior of targets (e.g. current - voltage relationship, deposition rate) and thin film properties (e.g. microstructure, stresses, electrical properties, in-film particles). While discussing these topics, attempts have been made to include examples from the actual commercial processes to highlight the increased complexity of the commercial processes with the growth of advanced technologies. In addition to personnel working in industry setting, university researchers with advanced knowledge of sputtering would also find discussion of such topics (e.g. attributes of target design, chamber design, target microstructure, sputter surface characteristics, various troubleshooting issues) useful.

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Unique coverage of sputtering target manufacturing methods in the light of semiconductor, displays, data storage and photovoltaic industry requirementsPractical information on technology trends, role of sputtering and major OEMs Discussion on properties of a wide variety of thin films which include silicides, conductors, diffusion barriers, transparent conducting oxides, magnetic films etc.Practical case-studies on target performance and troubleshootingEssential technological information for students, engineers and scientists working in the semiconductor, display, data storage and photovoltaic industry

Comprises four parts, the first of which provides an overview of the topics that are developed from fundamental principles to more advanced levels in the other parts. Presents in the second part an in-depth introduction to the relevant background in molecular and cellular biology and in physical chemistry, which should be particularly useful for students without a formal background in these subjects. Provides in the third part a detailed treatment of microscopy techniques and optics, again starting from basic principles. Introduces in the fourth part modern statistical approaches to the determination of parameters of interest from microscopy data, in particular data generated by single molecule microscopy experiments. Uses two topics related to protein trafficking (transferrin trafficking and FcRn-mediated antibody trafficking) throughout the text to motivate and illustrate microscopy techniques

Complete guide to methods, techniques and technologies of model-based engineering design for developing robust electronic systemsGives a toolbox of methods and models to choose from for the task at hand supported by numerous examples of how to put them into practiceShows how to adopt the methods using numerous industrial examples in the context of integrated circuit design

In the electronics industry today consumer demand for devices with hyper-connectivity and mobility has resulted in the development of a complete system on a chip (SoC). Using the old rule of thumb design methods of the past is no longer feasible for these new complex electronic systems. To develop highly successful systems that meet the requirements and quality expectations of customers, engineers now need to use a rigorous, model-based approach in their designs.

This book provides the definitive guide to the techniques, methods and technologies for electronic systems engineers, embedded systems engineers, and hardware and software engineers to carry out model- based electronic system design, as well as for students of IC systems design. Based on the authors considerable industrial experience, the book shows how to implement the methods in the context of integrated circuit design flows.

Complete guide to methods, techniques and technologies of model-based engineering design for developing robust electronic systems.Written by world experts in model-based designwho have considerable industrial experience.Shows how to adopt the methods using numerous industrial examples in the context of integrated circuit design.
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With the emergence of nanoscience and technology in the 21st century, research has shifted its focus on the quantum and optical dynamical properties of matter such as atoms, molecules, and solids which are properly characterized in their dynamic state. Quantum and Optical Dynamics of Matter for Nanotechnology carefully addresses the general key concepts in this field and expands to more complex discussions on the most recent advancements and techniques related to quantum dynamics within the confines of physical chemistry. This book is an essential reference for academics, researchers, professionals, and advanced students interested in a modern discussion of the niche area of nanotechnology.

This thoroughly updated new edition includes an entirely new team of contributing authors with backgrounds specializing in the various new applications of sputtering technology. It forms a bridge between fundamental theory and practical application, giving an insight into innovative new materials, devices and systems.

Organized into three parts for ease of use, this Handbook introduces the fundamentals of thin films and sputtering deposition, explores the theory and practices of this field, and also covers new technology such as nano-functional materials and MEMS.

Wide varieties of functional thin film materials and processing are described, and experimental data is provided with detailed examples and theoretical descriptions.

40% revision: the new edition includes an entirely new team of contributing authors with backgrounds specializing in the various new applications that are covered in the book and providing the most up-to-date coverage available anywhere.

The "Handbook of Thin Film Deposition" is a comprehensive reference focusing on thin film technologies and applications used in the semiconductor industry and the closely related areas of thin film deposition, thin film micro properties, photovoltaic solar energy applications, new materials for memory applications and methods for thin film optical processes. In a major restructuring, this edition of the handbook lays the foundations with an up-to-date treatment of lithography, contamination and yield management, and reliability of thin films. The established physical and chemical deposition processes and technologies are then covered, the last section of the book being devoted to more recent technological developments such as microelectromechanical systems, photovoltaic applications, digital cameras, CCD arrays, and optical thin films.

A practical survey of thin film technologies aimed at engineers and managers involved in all stages of the process: design, fabrication, quality assurance and applications.
Covers core processes and applications in the semiconductor industry and new developments in the photovoltaic and optical thin film industries.
The new edition takes covers the transition taking place in the semiconductor world from Al/SiO2 to copper interconnects with low-k dielectrics.
Written by acknowledged industry experts from key companies in the semiconductor industry including Intel and IBM.
Foreword by Gordon E. Moore, co-founder of Intel and formulator of the renowned Moore s Law relating to the technology development cycle in the semiconductor industry.
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Microelectronics is a challenging course to many undergraduate students and is often described as very messy.

"Semiconductors and Semimetals" has distinguished itself through the careful selection of well-known authors, editors, and contributors. Originally widely known as the "Willardson and Beer" Series, it has succeeded in publishing numerous landmark volumes and chapters. The series publishes timely, highly relevant volumes intended for long-term impact and reflecting the truly interdisciplinary nature of the field. The volumes in "Semiconductors and Semimetals" have been and will continue to be of great interest to physicists, chemists, materials scientists, and device engineers in academia, scientific laboratories and modern industry.
The series publishes timely, highly relevant volumes intended for long-term impact and reflecting the truly interdisciplinary nature of the field.

Since its inception in 1966, the series of numbered volumes known as "Semiconductors and Semimetals" has distinguished itself through the careful selection of well-known authors, editors, and contributors. The "Willardson and Beer" Series, as it is widely known, has succeeded in publishing numerous landmark volumes and chapters. Not only did many of these volumes make an impact at the time of their publication, but they continue to be well-cited years after their original release. Recently, Professor Eicke R. Weber of the University of California at Berkeley joined as a co-editor of the series. Professor Weber, a well-known expert in the field of semiconductor materials, will further contribute to continuing the series' tradition of publishing timely, highly relevant, and long-impacting volumes. Some of the recent volumes, such as "Hydrogen in Semiconductors, Imperfections in III/V Materials, Epitaxial Microstructures, High-Speed Heterostructure Devices, Oxygen in Silicon, " and others promise that this tradition will be maintained and even expanded. Reflecting the truly interdisciplinary nature of the field that the series covers, the volumes in "Semiconductors and Semimetals" have been and will continue to be of great interest to physicists, chemists, materials scientists, and device engineers in modern industry.
Written and edited by internationally renowned expertsRelevant to a wide readership: physicists, chemists, materials scientists, and device engineers in academia, scientific laboratories and modern industry

The design and study of materials is a pivotal component to new discoveries in the various fields of science and technology. By better understanding the components and structures of materials, researchers can increase its applications across different industries. Electronic Nose Technologies and Advances in Machine Olfaction is an academic scholarly resource that examines the emerging applications of odor-sensing devices as well as a better understanding of the designing process with the aid of neural networks and various other technologies. Featuring coverage on a broad range of topics including food spoilage detection, chemical sensing, and olfactometer, this book is a vital resource for engineers, academicians, researchers, students, and practitioners seeking current research on the advancements in applications of odor-sensing devices.

Since its inception in 1966, the series of numbered volumes known as "Semiconductors and Semimetals" has distinguished itself through the careful selection of well-known authors, editors, and contributors. The "Willardson and Beer" Series, as it is widely known, has succeeded in publishing numerous landmark volumes and chapters. Not only did many of these volumes make an impact at the time of their publication, but they continue to be well-cited years after their original release. Recently, Professor Eicke R. Weber of the University of California at Berkeley joined as a co-editor of the series. Professor Weber, a well-known expert in the field of semiconductor materials, will further contribute to continuing the series' tradition of publishing timely, highly relevant, and long-impacting volumes. Some of the recent volumes, such as "Hydrogen in Semiconductors, Imperfections in III/V Materials, Epitaxial Microstructures, High-Speed Heterostructure Devices, Oxygen in Silicon, " and others promise that this tradition will be maintained and even expanded. Reflecting the truly interdisciplinary nature of the field that the series covers, the volumes in "Semiconductors and Semimetals" have been and will continue to be of great interest to physicists, chemists, materials scientists, and device engineers in modern industry.

This book discusses one possible solution to the key issue in electronics engineering - the approaching limits of CMOS scaling - by taking advantage of the tendency of Schottky contacts to form at channel interfaces in nanoscale devices. Rather than suppressing this phenomenon, a functionality-enhanced device exploits it to increase switching functionality. These devices are Multiple-Independent-Gate-Field-Effect-Transistors, and other related nanoscale devices, whose polarity is electrostatically controllable. The functionality enhancement of these devices increases computational performance (function) per unit area and leads to circuits with better density, performance and energy efficiency. The book provides thorough and systematic coverage of enhanced-functionality devices and their use in proof-of-concept circuits and architectures. The theory and materials science behind these devices are addressed in detail, and various experimental fabrication techniques are explored. In addition, the potential applications of functionality-enhanced devices are outlined with a specific emphasis on circuit design, design automation and benchmarking.

An authoritative single-volume reference on the design and analysis of ESD protection for ICs Electrostatic discharge (ESD) is a major reliability challenge to semiconductors, integrated circuits (ICs), and microelectronic systems. On-chip ESD protection is a vital to any electronic products, such as smartphones, laptops, tablets, and other electronic devices. Practical ESD Protection Design provides comprehensive and systematic guidance on all major aspects of designs of on-chip ESD protection for integrated circuits (ICs). Written for students and practicing engineers alike, this one-stop resource covers essential theories, hands-on design skills, computer-aided design (CAD) methods, characterization and analysis techniques, and more on ESD protection designs. Detailed chapters examine an array of topics ranging from fundamental to advanced, including ESD phenomena, ESD failure analysis, ESD testing models, ESD protection devices and circuits, ESD design layout and technology effects, ESD design flows and co-design methods, ESD modelling and CAD techniques, and future ESD protection concepts. Based on the author's decades of design, research and teaching experiences, Practical ESD Protection Design - Features numerous real-world ESD protection design examples - Emphasizes on ESD protection design techniques and procedures - Describes ESD-IC co-design methodology for high-performance mixed-signal ICs and broadband radio-frequency (RF) ICs - Discusses CAD-based ESD protection design optimization and prediction using both Technology and Electrical Computer-Aided Design (TCAD/ECAD) simulation - Addresses new ESD CAD algorithms and tools for full-chip ESD physical design verification - Explores the disruptive future outlook of ESD protection Practical ESD Protection Design is a valuable reference for industrial engineers and academic researchers in the field, and an excellent textbook for electronic engineering courses in semiconductor microelectronics and integrated circuit designs.

The book focuses on the development of high performance, high efficiency electroactive polymers (EAPs), and electromechanically active polymers by controlling molecular chemical structure and morphology for all applications. This book is ideal for academicians and researchers in polymer and materials science.

This book sets out to explain the development of modern electronic systems and devices from the viewpoint of the semiconductor materials (germanium, silicon, gallium arsenide and many others) which made them possible. It covers the scientific understanding of these materials and its intimate relationship with their technology and many applications. It began with Michael Faraday, took off in a big way with the invention of the transistor at Bell Labs in 1947 and is still burgeoning today. It is a story to match any artistic or engineering achievement of man and this is the first time it has been presented in a style suited to the non-specialist. It is written in a lively, non-mathematical style which brings out the excitement of discovery and the fascinating interplay between the demands of system pull and technological push. It also looks at the nature of some of the personal interactions which helped to shape the modern technological world.
An introductory chapter illustrates just how dependent we are on modern electronic systems and explains the significance of semiconductors in their development. It also provides, in as painless a way as possible, a necessary understanding of semiconductor properties in relation to these applications. The second chapter takes up the historical account and ends with some important results emerging from the Second World War including its effect on the organisation of scientific research. Chapter three describes the world-shaking discovery of the transistor and some of the early struggles to make it commercially viable, including the marketing of the first transistor radio. In chapter four we meet the integrated circuit which gave shape to much of our modern life in the form of the personal computer (and which gave rise to a famously long-running patent war ). Later chapters cover the application of compound semiconductors to light-emitting devices, such as LEDs and lasers, and light detecting devices such as photocells. We learn how these developments led to the invention of the CD player and DVD recorder, how other materials were applied to the development of sophisticated night vision equipment, fibre optical communications systems, solar photovoltaic panels and flat panel displays. Similarly, microwave techniques essential to our modern day love of mobile phoning are seen to depend on clever materials scientists who, not for the first time, "invented" new semiconductors with just the right properties.
Altogether, it is an amazing story and one which deserves to be more widely known. Read this book and you will be rewarded with a much deeper understanding and appreciation of the technological revolution which shapes so many aspects of our lives.
- A historical account of the development of semiconductor physics, devices and applications from the nineteenth century to the present day
- Coverage of the importance of material quality and its relation to the physics of the devices
- Presented in a strictly non-mathematical and anecedotal way, to appeal to a wide audience
- Provides the broad sweep of science history"

Automatic identification has evolved to use techniques that can identify an object or subject without direct human intervention. Such devices include the bar code, magnetic-stripe, integrated circuit, and biometric and radio-frequency identification. Innovative Automatic Identification & Location-Based Services: From Bar Codes to Chip Implants emphasizes the convergence and trajectory of automatic identification and location-based services toward chip implants and real-time positioning capabilities. Recording the history of automatic identification, this book also discusses the social, cultural, and ethical implications of the technological possibilities with respect to national security initiatives.

With the fast pace of developments in quantum technologies, it is more than ever necessary to make the new generation of students in science and engineering familiar with the key ideas behind such disruptive systems. This book intends to fill such a gap between experts and non-experts in the field by providing the reader with the basic tools needed to understand the latest developments in quantum communications and its future directions. This is not only to expand the audience knowledge but also to attract new talents to this flourishing field. To that end, the book as a whole does not delve into much detail and most often suffices to provide some insight into the problem in hand. The primary users of the book will then be students in science and engineering in their final year of undergraduate studies or early years of their post-graduate programmes.